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Overview of integrated chamber system (click)
General specification
e-beam evaportor chamber
General specification
XL25 holder is available.
Deposition of metallic layers controlled in angstrom (Å) level.
Temperature controllable sample stage(~1000℃).
Co, Pt, Pd and Cu sources.
In-situ Magneto-Optical Kerr Effect (MOKE) measurement.
DC sputtering chamber (6 target)
General specification
2” & XL25 holders are available.:(2” holder) x 3EA + (XL25) x 3EA
6 targets are set up. (NiFe, CoFe, CoFeB, IrMn, Ru, Ta)
Temperature controllable sample stage (~600℃)
DC Sputtering chamber (1 target)
General specification
2” holder is available.
Temperature controllable sample stage(~600℃)
RF sputtering chamber
General specification
2” holder is available
RF power source
Insulating material deposition
Annealing chamber
General specification
2” holder is available.
Temperature range : ~350℃ (1hour)
Magnetic field range : ~4kOe
Pulsed Laser Deposition Chamber
General specification
Main Chamber : 1 X 10-9 Torr
Load-lock Chamber : 1 X 10-8 Tor
Substrate holder : max temp. 1000℃ (halogen lamp)
6 – target carrousel
Excimer Laser System
General specification
Model :COMPexPro201 (Lambda Physik)
Size : 1682 X 375 X 793 (mm)
Specs : Pulse energy : 700 mJ @ 248 nm, 5 Hz, 30 kV
Average power : 4 W @ 248 nm, 10 Hz, 30 kV